Path-Creating Networks:
Innovating Next Generation Lithography
in Germany and the U.S.
Innovating Next Generation Lithography
in Germany and the U.S.
In the semiconductor industry, the basic production
technology called optical lithography is presently
facing commercial and technological limits, thus
forcing the semiconductor companies to look for
succeeding technologies which are commonly
referred to as next generation lithography (NGL).
In order to create a new production technology chip makers, suppliers and university laboratories have to co-ordinate an array of novel technologies, each with its own technical and economic challenges. Around the globe, especially in the U.S., Europe and Japan, they organise their activities in multiple R&D consortia, joint ventures and government research programmes which serve as a locus for organising the individual efforts.
In order to create a new production technology chip makers, suppliers and university laboratories have to co-ordinate an array of novel technologies, each with its own technical and economic challenges. Around the globe, especially in the U.S., Europe and Japan, they organise their activities in multiple R&D consortia, joint ventures and government research programmes which serve as a locus for organising the individual efforts.
News
- Paths of Developing Complex Technologies:
Insights from Different Industries
Workshop at the Free University of Berlin,
September 17-18, 2007
sponsored by the Volkswagen Foundation
[Report]
Award Holders
Researcher
Publications
2007
Schubert, C./Windeler, A.: Pfadkreationsnetzwerke aus methodischer Sicht.
In: Hof, H./Wengenroth, U. (Hrsg.): Innovationsforschung. Ansätze, Methoden, Grenzen und Perspektiven.
Hamburg, S. 117-126.
2007
Windeler, A./Schubert, C.:
Technologieentwicklung und Marktkonstitution.
In: Beckert, J./Diaz-Bone, R./Ganssmann, H. (Hrsg.):
Die sozialen Strukturen des Marktes. Campus. Frankfurt a. M. (in Print).
2007
Schubert, C.:
Technology Roadmaps in der Halbleiterindustrie. Das Hier und Jetzt
technologischer Zukünfte am Beispiel der International Technology
Roadmap for Semiconductors. TUTS Working Paper 2-2007. Berlin,
Technische Universität, Institut für Soziologie.
[Link]
2005
Sydow, J./Windeler, A./Möllering, G./ Schubert C.: Path-Creating Networks:
The Role of Consortia in Processes of Path Extension and Creation. Paper presented
at the 21st EGOS Colloquium, Berlin.
2005
Sydow, J./Schreyögg, G./Koch, J.: Organizational Paths: Path Dependency
and Beyond. Paper presented at the 21st EGOS Colloquium, Berlin. Abrufbar unter
„Neuerscheinungen“ – „Publications on Demand" unter www.pfadkolleg.de/
2004
Sydow, J./ Windeler, A./Möllering, G.: Path-Creating Networks in the Field of
Text Generation Lithography: Outline of a Research Project. TUTS -
Working Paper.
[Link]
2003
Windeler, A.: Kreation technologischer Pfade: ein strukturationstheoretischer
Analyseansatz. In. Schreyögg, G./Sydow, J. (Hrsg.): Managementforschung 13.
Gabler. Wiesbaden, S. 295-328.
2003
Schreyögg, G./Sydow, J./Koch, J.: Organisatorische Pfade – Von der Pfadabhängigkeit
zur Pfadkreation? In: Schreyögg, G./Sydow, J. (Hrsg.): Managementforschung
13. Gabler. Wiesbaden, S. 257-294.
Projects
Path-Creating Networks:
Innovating Next Generation Lithography in Germany and the U.S. [Link]
Innovating Next Generation Lithography in Germany and the U.S. [Link]
Theories and Practices of Developing Competences in Network Structures [Link]
Evaluating and Monitoring the Development of the OpTecBB Network [Link]
Competence Development in International Supplier Networks of the Automotive Industry [Link]
Optics Clusters in Britain, Germany and the United States [Link]
